ION PLAZMA USULIDA SHAKKLANTIRILGAN MN4SI7 NANOFAZASINING KINETIK PARAMETRLARI
DOI:
https://doi.org/10.65164/nqnp5e59Keywords:
Mn4Si7, magnetron changlatish, nanoplyonka, kinetik parametrlar, Zebek koeffitsienti, termoelektrik samaradorlik, SEM.Abstract
Ushbu tadqiqot ishida ion-plazmali magnetron changlatish texnologiyasi
yordamida yuqori marganes silitsidi (Mn4Si7) asosidagi nanostrukturali yupqa qatlamlarni olish
jarayonlari ko‘rib chiqilgan. Ishning asosiy maqsadi - sintez qilishning texnologik rejimlari va hosil
bo‘lgan nanoplyonkalarning kinetik koeffitsientlari orasidagi bog‘liqlikni aniqlashdan iborat.
Tadqiqot davomida nanostruktura o‘lchamining kamayishi zaryad tashuvchilarning sochilish
mexanizmiga va Zebek koeffitsientining ortishiga olib kelishi isbotlangan. Olingan natijalar Mn4Si7
nanoplyonkalarining termoelektrik quvvat faktori hajmiy namunalarga nisbatan yuqori ekanligini
ko‘rsatdi. Ushbu ish mikroelektronika uchun yuqori samarali va ekologik xavfsiz termoelektrik
datchiklar yaratishda muhim ilmiy asos bo‘lib xizmat qiladi.
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